1535nm 400µJ Erbium-Glass Laser Source

1535nm 400uJ erbium-glass laser transmitter product image

Overview

The 1535nm 400µJ Erbium-Glass Laser Source is a compact 1535 nm eye-safe-band pulsed transmitter for OEM integration in laser rangefinders, remote-sensing instruments and scientific measurement systems. It delivers ≥400 µJ in a 3–6 ns pulse at a 1–10 Hz repetition rate.

  • Output — ≥400 µJ pulse energy, 3–6 ns FWHM, 1–10 Hz repetition rate
  • Beam — 1535 ± 5 nm, M² ≤1.3, 0.3 mm spot (1/e²), divergence ≤15 mrad
  • Pump drive — 15 A at <2 V, ≤2.5 ms pump pulse
  • Environment — −40 °C to +65 °C operating, −50 °C to +75 °C storage
  • Life & mass — >10⁷ shots, 11 g

Technical reference 1535-LXER400. Request the full specification to confirm the optical, electrical and mechanical configuration for your platform.

Used in: ranging laser sources and laser ranging.

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Descriptions

1535nm 400µJ Erbium-Glass Laser Source is a compact pulsed optical source for civil, industrial, and scientific OEM equipment. The 400µJ pulse-energy class gives design teams a defined starting point for optical ranging, sensing, and laboratory instruments while preserving attention to package, electrical, and environmental constraints.

Technical reference: 1535-LXER400. Confirm the final optical, electrical, mechanical, and environmental configuration against the order-specific technical specification before design release.

Key parameters

ParameterLocal specification value
Laser wavelength1535 nm
Pulse energy400 uJ
Pulse repetition frequency1~10 Hz
Pulse width3~6 ns
Beam divergence≤15 mrad
Supply voltage<2 V
Operating temperature-40~+65 ℃
Weight11 g

Applications

  • compact ranging instruments
  • remote sensing platforms
  • scientific measurement equipment
  • OEM optical subsystems

Integration notes

We recommend confirming the final optical, electrical, mechanical, and environmental configuration against the order-specific technical specification before design release. This keeps the selected erbium glass laser aligned with the host system and its operating conditions.

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